PMIC offers its unique and versatile thin-film deposition and characterization capabilities for research and technology development to industry, startups, and academic researchers.
Thin-film deposition, treatment, and metrology tasks can be performed by PMIC staff as a service. One of the main strengths and advantages of our unique technical setup is the possibility to perform an in-situ combination of efficient surface cleaning, specimen heating, and physical vapor deposition using sputtering or thermal evaporation. Our 6500 sq. ft lab space accommodates a 72 sq. ft class 1000 (ISO 6) cleanroom container housing the PVD thin-film technique.